Parasitic Resistance¶
Parasitic resistance checks identify unwanted ohmic paths, contacts, vias, and interconnect losses before superconducting operation.
# |
Parameter |
Symbol / Unit |
Extraction Method |
Typical Q3D Value |
Ideal / Optimal |
Good Range |
Worst Case |
Why It Matters |
Key Design Note |
|---|---|---|---|---|---|---|---|---|---|
21 |
Series JJ Parasitic Resistance |
R_ser / Ω |
RF impedance spectroscopy; Q3D lead model |
< 0.01 Ω |
< 0.01 Ω (clean superconducting) |
0.01 – 0.1 Ω |
> 1 Ω |
Quasiparticle conductance in JJ leads causes T₁ decay via Ohmic dissipation in qubit circuit |
Quasiparticle poisoning (stray radiation) transiently raises R_ser; shielding critical at mK |
22 |
Shunt Parasitic Resistance (R_p) |
R_p / kΩ |
Q3D G matrix → R_p = 1/G_ii |
> 1 MΩ |
> 1 MΩ (effectively open) |
100 kΩ – 1 MΩ |
< 10 kΩ |
Parallel leakage path across qubit capacitor reduces effective Q = R_p·√(C/L) |
Substrate residues from lithography are the most common cause; requires thorough O₂ plasma clean |
23 |
Wirebond / Bump Resistance |
R_wb / mΩ |
4-probe TDR; Q3D bond-wire cylinder model |
< 5 mΩ per bond |
< 5 mΩ |
2 – 20 mΩ |
> 100 mΩ |
Parasitic series resistance contributes to insertion loss and thermal noise at 4K |
Au–Au thermo-compression bonds have lower and more repeatable R_wb than Al wedge bonds |
24 |
Metal Interface Contact Resistance |
R_c / mΩ |
TLM structure measurement; Q3D metal stack |
< 1 mΩ (clean Al–Al) |
< 1 mΩ |
1 – 10 mΩ |
> 50 mΩ |
Interface resistance at Al–Au and Al–Nb transitions is critical in 3D integration |
Native Al₂O₃ (2–4 nm) must be removed by Ar ion milling before deposition for low R_c |